Development and application of new methodology in surface analytical measurement of semiconductor nanostructures

Nyomtatóbarát változatNyomtatóbarát változat
PhD típus: 
Doctoral School of Physical Sciences
Év: 
2021/2022
Témavezető: 
Név: 
Olga Krafcsik
Email cím: 
krafcsik@eik.bme.hu
Kutatóintézet/Tanszék: 
Department of Atomic Physics, Institute of Physics
Beosztás: 
associate professor
Tudományos fokozat: 
PhD
Leírás: 

Semiconductor nanostructures, i.e., nanoparticles are promising building blocks for several applications from life sciences - in which nanostructure-based systems offer a revolution in diagnostics and therapy -  to quantum technology - where the nanostructures are the hosts for quantum emitters capable of quantum sensing -, and quantum computing where they allow researchers and engineers to build efficient quantum repeaters. Nanoparticles with sizes close to the exciton Bohr radius's size undergo quantum confinement that changes the bulk properties. Composition and surface chemistry, however, also influence the physical and chemical properties and regulate the interaction between the nanostructure and the environment. Such a complex system needs complex characterization methods to recognize and distinguish the size and chemistry effect. Surface analytical methods, such as X-ray Photoelectron Spectroscopy (XPS), Ultraviolet Photoelectron Spectroscopy (UPS), and Secondary Ion Mass Spectroscopy (SIMS), are versatile tools to face the given difficulty. Nevertheless, the surface analytical methods' sampling depth is a few atomic layer comparable to the bulk volume of the nanostructures demanding a new methodology to be developed.

Nanostructures will be produced in Wigner Institute, surface analytical measurements will be carried out in BME Atomic Physics Department Surface Analytical Laboratory, where a new SIMS Workstation - unique in Hungary - will be installed in 2022 and an XPS equipped with a new electron energy analyser, x-ray gun and ion gun is also available.

The successful candidate will study silicon carbide and similar nanostructures by surface analytical tools and spectroscopic methods and will develop new protocols for ultrasmall nanostructure characterization.
 

Elvárások: 

Motivation for experimental work, willingness to learn new measurement methods and apply them on high level, good communication skills, the candidate should be able to work in group and on his/her own also.

 

Munkahely neve: 
Department of Atomic Physics, Institute of Physics, BME
Munkahely címe: 
BME, 1111 Budapest, Budafoki 8